Nanyte Beam Maskless Lithography
Instrument Details
The Nantye beam is a desktop, maskless lithography tool enabling at will nanopatterning without the use of a photomask. It uses a digital micromirror device (DMD) which acts as a dynamic mask and projects the pattern onto the sample under UV LED illumination, one write field at a time, while the stage steps across the substrate. Patterns can be imported from GDS, DXF, or image files, or drawn directly in the control software.
The current tool settings allow for a 600um writefield, 0.8um minimum feature size, 0.5um alignment accuracy, and a write speed of 15mm2/min, over a 4” sample size.
This easy-to-use lithography system is well suited to rapid prototyping, patterning on 2D materials, fabricating photonic and MEMS structures, and any patterning application where patterning of microscale details is needed.
For more information, see https://nanyte.com
The image above is an example of the what this system can write. The logo is approximately the width of a human hair (50um)
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