The Nanomaster RIE-4000 is a high performance inductively coupled plasma reactive ion etcher (ICP-RIE.) It features a nickel plated Aluminum chamber with heated walls, and a temperature controlled patent (-30°C to 150°C ) capable of handling up to 8 inch wafer and equipped with helium backside cooling. The Nanomaster has a base Chamber pressure of 5E-6, 300W bias power and 600W ICP power. The systems has automated pressure control, Auto load/unload through chamber load lock, and a gas pod or hazardous gases with leak sensors. Additionally, the Nanomaster features an Optical emission spectroscopy system for automated end point detection.